FABRICATION OF AMORPHOUS SOFT MAGNETIC FILM

摘要

PURPOSE:To make magnetostriction almost zero by increasing a saturated magnetic flux density and a permialibity by fabricating a Cp-Zr-Re triple alloy amorphous soft magnetic film in which the Re content is limitted by an ion beam spattering method. CONSTITUTION:The titled film is fabricated by ion beam spattering method using Co-Zr-Re triple alloy including Re of 4atm% or less. Ar ion beams 6 generated by the ion gun 1 of an ion beam spattering device are accelerated by a grid 2 and are projected to a target 3 which is arranged in a vacuum tank 7 at the predetermined angle. The target particles spattered there are deposited on the substrate 4 which is supported by a substrate holder 5, resulting in the vapor deposition by spattering. Then it becomes possible to obtain the film of good characteristics which has higher specific resistance, saturated magnetic flux density and permeability compared with a Co-Zr-Re amorphous alloy film formed by RF spattering, and further in which a magnetostriction is almost zero.