| 摘要 |
A quartz diffusion boat for carrying semiconductor wafers during very high temperature semiconductor manufacturing operations includes first and second quartz rails having first and second sets of wafer supporting grooves, respectively. Each wafer supporting groove of the first set includes a steeply inclined surface that contacts one point of an edge of a first face of a wafer, urging a peripheral portion of the opposite second face of that wafer against an opposite flat vertical wall of that groove. The steeply inclined surface of a corresponding wafer supporting groove of the second set contacting one point of an edge of the second face of the same wafer urges a peripheral portion of the first wafer face against an opposite flat vertical wall of the second groove. The wafers are prevented from tilting away from either flat vertical wall and therefore are held precisely parallel in the wafer supporting grooves. Rattling the wafers during movement of the boat, and resulting production of silicon dust and quartz dust is avoided.
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