发明名称 PATTERN INSPECTING DEVICE
摘要 <p>PURPOSE:To enable to improve the throughput capacity of the titled device by a method wherein the model pattern and a detecting pattern are compared by the defect discriminator and when there is a defect, the coordinates on the mask, wherein the defect exists, are not only memorized, but also the model and detecting patterns of the ambient image including the defect are memorized. CONSTITUTION:The detection pattern signal (a), which is the output of an image sensor, is memorized in tandem connected temporary storage buffer memories 161-16m. The signals memorized are selected by a multiplexer 15 and the selected signal is inputted in a defect detecting circuit 17 and an image memory 20, while the signal (b) from a model pattern generator is also inputted in buffer memories 191-19m in the same manner, the signals inputted are selected by a multiplexer 18 and the selected signal is inputted in the circuit 17 and the memory 20. When any defect is not detected for a constant time, a pattern selective signal C2 is outputted from the multiplexers 15 and 18 and when a defect is detected, a transmission of signal to the circuit 17 and the memory 20 is stopped, an instruction C3 is sent to a DMA controller 21 and the contents of the memory 20 are transmitted to a magnetic disc 23.</p>
申请公布号 JPS6119139(A) 申请公布日期 1986.01.28
申请号 JP19840139030 申请日期 1984.07.06
申请人 HITACHI SEISAKUSHO KK 发明人 MATSUYAMA YUKIO;OKAMOTO KEIICHI;NAKAHATA MITSUZOU;DOI HIDEAKI;NOMOTO MINEO
分类号 H01L21/66;G01N21/88;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30 主分类号 H01L21/66
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