| 摘要 |
PURPOSE:To measure dimensions of a micropattern with extremely high precision, by irradiating an image of a interference color proportional to a differential value of inclination of a pattern edge. CONSTITUTION:When 2 kinds of plane liquid available for interference are irradiated, as a flat matrix part and top part become free from a light path difference, both parts become darkened and an interference color is developed only in a stepped edge part corresponding to the light path difference. In an interference optical system 10, an image proportional to the differential value of inclination of the edge of a resist 2 is developed on the plane surface of an analyzer 17. A read-out scanning system 20 develops an optical image on a image receiver 23 after processing electrically an image developer 21 which converts an optical image of the analyzer 17 into an image signal and this image signal and at the same time, by calculating a dimensional value between positions of different contrasts for displaying the results on said image receiver 23. |
