| 摘要 |
PURPOSE:To get off with a small quantity of ester silicate content as well as to widen its tolerance, by forming a silicon dioxide film forming the back of a black substance in a way of hydrolizing a reacting solution containing one type of phosphoric acid in ester silicate or the like. CONSTITUTION:After applying suspension of a light absorbent black substance 4 and forming a black matrix 10 on an inner surface of panel glass 1, 4wt% of an ethyl silicate solution composed of, for example, ethyl silicate 4.0wt%, orthophosphate 0.4wt%, water 0.4wt% and ethanol as the rest and containing phosphoric acid is applied and hydrolized, thus a silicon dioxide film is formed up. Afterward, a phosphor screen 22 is completed by photogravure. With this constitution, it gets off with a small quantity of ester silicate content, while its tolerance is enlargeable. In addition, generation of uneven application is reducible to a large extent. |
