| 摘要 |
PURPOSE:To monitor pit dimensions in an optically stabilized state which are in course of development, by providing an area where a developer brought into contact with the surface of a substrate flows in the rotation direction of the substrate as a laminar flow and setting the irradiating position of a monitor light to this area. CONSTITUTION:When a developer 4 is supplied from a nozzle 3 to the surface of a rotating original disc 1 where a photoresist film is subjected to exposure processing, the developer flows in the rotation direction as a laminar flow for a while, and the liquid surface is smooth and stable on this area. When a laser light 55 is irradiated to this position from the rear side of the original disc, a diffracted light of the 1st order diffracted by a pit row formed by development of the photoresist film has stable intensity and direction, and a photo diode 20 is detected to discriminate accurately whether the intensity of the diffracted light of the 1st order is a prescribed value or not. Consequently, the precision of pit dimensions of the original disc 1 is improved. |
