| 摘要 |
PURPOSE:To efficiently form a highly accurate bit pattern without employing any metal mask, by utilizing the interference of ultraviolet monochromatic light employed in the optical pumping CVD. CONSTITUTION:A glass substrate 2 is placed on a susceptor 1 made of, e.g., silicon and is heated to 300-200 deg.C by a light source 4, and Si2H6 gas as a material gas is supplied into a reaction chamber 3. Ultraviolet monochromatic light beams UV1, UV2 split by a beam splitter are applied to the glass substrate 2 from two respective directions at an angle of intersection theta. By introducing the ultraviolet monochromatic light beams UV1, UV2 from two directions and intersecting them each other in this way, an interference pattern composed of dark and light portions at a pitch of lambda/sintheta (lambda is a wavelength) is formed on the surface of the glass substrate 2 by the interference between the two light beams. In the light pattern portion of the interference pattern, decomposition of the Si2H6 is caused on the surface of the substrate 2 by the irradiation with the light, and an a-Si:H film is deposited on the surface of the substrate 2. |
