发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To reduce an exposure amt. necessary for insolubilizing a resin in developing water, and to obtain a sharp image by incorporating a PVAL type polymer having an alkyl or an F-contg. group on the terminal and a photosensitive agent. CONSTITUTION:The intended photosensitive material contains a PVAL type polymer having on the terminal an alkyl group, preferably, such as 2-24C alkyl, far preferably, 4-20C alkyl, and an F-contg. group. The F-contg. group used here is represented by the formula Rf-(X)m-, where m is 0 or 1, and Rf is selected from fluoroalkyl and fluoroalkyl ether, and X is selected from alkylene, alkylene ether, alkyleneamide, alkylene thioether, alkyleneimide, and alkyl ester. The use of such photosensitive resin compsn. can reduce an exposure amt. necessary for insolubilizing the resin in developing water, and it can form a sharp image. Peelability of a negative film, etc., from the surface of the obtained photosensitive resin can be improved, too.
申请公布号 JPS614039(A) 申请公布日期 1986.01.09
申请号 JP19840126185 申请日期 1984.06.18
申请人 KURARAY KK 发明人 SATOU TOSHIAKI;YAMAUCHI JIYUNNOSUKE;OKAYA TAKUJI
分类号 G03F7/004;G03F7/032;G03F7/038 主分类号 G03F7/004
代理机构 代理人
主权项
地址