| 摘要 |
Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: <IMAGE> wherein R1, R2, R3 and R4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: <IMAGE> wherein Z is a cyclic dibasic acid residue, R5 is a C1 to C3 alkylene group, R6 is hydrogen atom or methyl group, and R7 is hydrogen atom, methyl group, ethyl group or CH2X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.
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