PHOTOSENSITIVE COMPOSITION AND FORMATION OF PATTERN USING IT

摘要

A photosensitive composition having an adhesive property on exposure to light comprises a p-amino benzene diazonium salt(I), an o-amino benzene diazonium salt(II), and a m-amino benzene diazonium salt(III) , where R1, R2 = linera alkyl chain or H; both R1 and R2 are not H; and R3, R4 = H, linear alkyl chain, or alkoxy gp. Amount of (II) and /or (III) is in the range of 3-100 wt.% with respect to (I). Improved coating property of the composition is obtained by adding an organic polymer compd. and /or a surface active agent.