| 摘要 |
PURPOSE:To suppress the deterioration of a metal hydride and stably purify H2 gas of high purity, by injecting crude H2 gas containing impurity gases, e.g. CO, into a vessel filled with the metal hydride at a specific temperature, heating the metal hydride, and decompressing the vessel to discharge the impurity gases in the vessel together with the H2 gas. CONSTITUTION:Crude H2 gas containing impurity gases, e.g. CO, is injected into a vessel filled with a metal hydride, e.g. LaNi4.85Al0.15, at 30 deg.C to occlude the H2 gas in the metal hydride. The temperature of the metal hydride is increased above a temperature at which the H2 gas release pressure of the above-mentioned metal hydride is equal to the H2 gas occlusion pressure thereof by heating, and the interior of the vessel is then decompressed to expel the impurity gases, e.g. CO, remaining in the vessel together with the H2 gas released from the metal hydride. Thus, the H2 gas of high purity is released and recovered from the metal hydride. The hydrogen occlusion characteristics of the metal hydride are not deteriorated by the impurity gases, e.g. CO, and the H2 gas of high purity can be obtained for a long period.
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