| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which has a low impurity content, has a fine crystal structure, reduces formation of particles in sputtering and has a high density; and a manufacturing method therefor. SOLUTION: This manufacturing method comprises melting a high melting point metal ingot of a raw material with a vacuum electron-beam melting method to form a metal sheet; forming a linearly melted portion by focusing the electron beam onto the formed metal sheet and irradiating it with the beam, to linearly melt the surface of the metal sheet so that the each melt line can be approximately parallel to others at almost regular intervals; and further forming a grid-like melted portion on the surface of the metal sheet, by focusing the electron beam onto the formed metal sheet and irradiating it with the beam, to form a linear melt portion so that each melt line can intersect the already formed melt portion and be approximately parallel to others at almost regular intervals. COPYRIGHT: (C)2005,JPO&NCIPI
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