发明名称 Method of producing a semiconductor device
摘要 There is provided a method of producing a semiconductor device comprising a protecting silicone gel layer which covers a semiconductor chip and bonding wires for taking electrodes out of this chip, and a resin layer which has a smaller thermal expansion coefficient than that of this silicone gel layer at least part of which contacts the silicone gel layer. This method comprises the steps of: thermally expanding the silicone gel layer until it reaches the product environmental guarantee temperature which comes before the cure acceleration reaction in the resin layer; and completely curing the resin layer while maintaining the volume of the silicone gel layer at the same time, thereby fixedly adhering it with the other parts.
申请公布号 US4558510(A) 申请公布日期 1985.12.17
申请号 US19840592596 申请日期 1984.03.23
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 TANI, KEIZO;OGASAWARA, MASAHIRO
分类号 H01L21/56;H01L23/24;H01L23/28;H05K7/00;(IPC1-7):H05K5/06;H01L23/30 主分类号 H01L21/56
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