PHOTOSENSITIVE COMPOSITION AND 2-COMPONENT DIAZO TYPE MATERIAL COMPRISING THE SAME,申请号JP19850104156-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	PHOTOSENSITIVE COMPOSITION AND 2-COMPONENT DIAZO TYPE MATERIAL COMPRISING THE SAME
摘要
申请公布号	JPS60256140(A)	申请公布日期	1985.12.17
申请号	JP19850104156	申请日期	1985.05.17
申请人	HOECHST AG	发明人	JIIKUFURIIDO SHIEERAA
分类号	G03C1/52;G03C1/58;G03C1/60	主分类号	G03C1/52
代理机构		代理人
主权项
地址

您可能感兴趣的专利

CYLINDRICAL SECONDARY BATTERY AND METHOD OF MANUFACTURING THE SAME

PIXEL CIRCUIT, DRIVING METHOD FOR PIXEL CIRCUIT, DRIVE CIRCUIT FOR PIXEL CIRCUIT, AND ELECTRO-OPTIC DEVICE

WALKING-BEAM TYPE FURNACE

MACHINING DEVICE AND METHOD

IMAGE READER AND IMAGE FORMING DEVICE PROVIDED WITH THE SAME

RADIATION-CURABLE SILICONE COMPOSITION

COMBINED DRIVING MOTOR

SIGNAL LEVEL ADJUSTMENT DEVICE, SIGNAL LEVEL ADJUSTMENT METHOD AND PROGRAM

IMAGE DATA ACQUISITION DEVICE AND IMAGE DATA ACQUISITION DEVICE CONTROL PROGRAM

REPRODUCING DEVICE

POWER AMPLIFIER AND TRANSMITTER

RELAY DEVICE, WIRELESS COMMUNICATION DEVICE, CONTROL METHOD AND COMMUNICATION SYSTEM

PORTABLE COMMUNICATION DEVICE

IMAGING SYSTEM, IMAGING INSTRUCTION DEVICE, IMAGING INSTRUCTION METHOD, AND IMAGING INSTRUCTION PROGRAM

ELECTRONIC CONTROL DEVICE

IMAGE DISPLAY APPARATUS, IMAGE DISPLAY METHOD, AND PROGRAM

HORIZONTAL DIFFUSION FURNACE AND METHOD FOR HEAT-TREATING SEMICONDUCTOR WAFER USING THE SAME

PHOTOGRAPHING SUPPORT SYSTEM, INFORMATION PROCESSOR, PROGRAM, AND PHOTOGRAPHING SUPPORT METHOD