发明名称 ALIGNMENT PATTERN DETECTOR FOR REDUCED PROJECTION EXPOSING APPARATUS
摘要 PURPOSE:To reduce random noise of detected signal, by compressing effectively two-dimensional reflected light intensity distribution into one-dimensional light intensity distribution in the pattern position detecting direction. CONSTITUTION:A two-dimensional reflected light intensity distribution developped on a two-dimensional array solid-state pick-up device 36 from the wafer target pattern includes two-dimensional random noise. Therefore, compressing this two-dimensional light intensity distribution in the direction perpendicular to the pattern position detecting direction results in a one-dimensional light intensity distribution caused the random noise to reduce in the pattern position detecting direction. In this way, the two-dimensional reflected light intensity distribution including random noise can be compressed into the one-dimensional light intensity distribution in the pattern position detecting direction, so that the random noise can be reduced extremely to improve the alignment pattern detecting precision.
申请公布号 JPS60245223(A) 申请公布日期 1985.12.05
申请号 JP19840100517 申请日期 1984.05.21
申请人 HITACHI SEISAKUSHO KK 发明人 NAKADA TOSHIHIKO;OSHIDA YOSHISADA;SHIBA MASATAKA
分类号 H01L21/30;G03F7/20;H01L21/027 主分类号 H01L21/30
代理机构 代理人
主权项
地址