| 摘要 |
PURPOSE:To subject the sample to micro-processing or analyze a very small area of the sample using a thin flux ion beam discharged from a liquid metal ion source by maintaining the temperature of the sample surface higher than the melting point of an ionic substance. CONSTITUTION:While the temperature of a sample 3 is maintained higher than the melting point of a primary ionic substance by means of a heater 5 or 10, the sample 3 is subjected to processing or analysis by irradiating an ideally placed beam 2 upon the sample 3. Irradiation efficiency and analytic sensitivity can be improved by introducing an active gas as necessary so as to prevent any adhesion of a primary ionic substance to the sample surface, thereby improving the accuracy of the irradiation and the analysis. Heating of the sample 3 and introduction of the inactive gas greatly improves irradiation speed and analytic sensitivity.
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