PERFEZIONAMENTO NELLE MASCHERE PER LA PRODUZIONE DI DISPOSITIVI AD ALTA RISOLUZIONE COME I DOMINI MAGNETICI A BOLLE E PROCEDIMENTO DI FABBRICAZIONE

摘要

There is described a mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures and semiconductor device structures. The mask includes a support which is substantially transparent to various types of radiation such as, but not limited to, E-beams and X-rays. A layer of material which is substantially opaque to the same radiation and which can have the solubility thereof changed by application of E-beams or other radiation is provided on the support. The mask is exposed to the solubility changing radiation wherein a pattern is defined in the layer and the layer is etched in a non-critical etch so that the soluble portion thereof is removed and the remaining material provides a suitable pattern. An auxiliary support member can be provided if the support is flexible.