| 摘要 |
PURPOSE:To improve the accuracy of monitoring a plasma etching or depositing by providing a window for passing a light to a waveguide of a plasma etching device, thereby efficiently collecting the emitting light or interfering light. CONSTITUTION:Samples 6 to be machined are placed on sample bases 7a, 7b. A microwave is generated by a magnetron 1, and fed through a waveguide 2 to a discharge unit 3. An electromagnet or a permanent magnet 5 is provided in the unit 3 to aid the generation of the plasma. Windows 8, 9 for passing lights are formed at the guide 2. Metal meshes are provided in the windows 8, 9 in the degree for not disturbing the light collection. Since the windows 8, 9 are provided near a light generation source, the emitting light or interfering light of the plasma can be efficiently collected. |
