| 摘要 |
PURPOSE:To check adhesion of sulfur not to participate in formation of a compound to the inside wall of a vacuum tank and other parts at vacuum evaporation of the sulfur compound by a method wherein a sulfur absorbent is set up in the vacuum tank. CONSTITUTION:S and Cd are put in crucibles 4a, 4b respectively independently to be heated. Then after the temperatures of both the crucibles 4a, 4b reached the prescribed temperature together, shutters 5a, 5b are opened. Thereupon S and Cd are blasted off from the crucibles 4a, 4b come flying to a substrate 3, and a CdS film is formed thereon. S and Cd not participated in formation of the compound are reacted to be absorbed with sulfur absorbents 6. Accordingly, deterioration of apparatuses in the vacuum tank according to adhesion of S can be checked, and because even S evaporated again after adhered once to the parts other than the substrate 3 can be caught by the absorbents 6, and to come flying on the substrate 3 can be checked, control of the composition ratio of the sulfur compound is facilitated. |
