发明名称 Mask aligner having a malfunction disposal device
摘要 A mask aligner for aligning a wafer with a mask and exposing the wafer to an image of the mask, includes an illumination source for illuminating the mask, plural devices for executing plural functions of the aligner, a controller for controlling operation of the apparatus in accordance with a predetermined routine, a detector for automatically detecting a malfunction, a memory of plural routines for disposing of one kind of malfunction; a selector for manually selecting one of the routines; and another controller for controlling the apparatus in accordance with the selected routine, when the detector detects a malfunction.
申请公布号 US4553834(A) 申请公布日期 1985.11.19
申请号 US19830554633 申请日期 1983.11.23
申请人 CANON KABUSHIKI KAISHA 发明人 AYATA, NAOKI;KONUKI, TADASHI
分类号 H01L21/30;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 主分类号 H01L21/30
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