| 摘要 |
PURPOSE:To simplify measurement and to reduce the size of an instrument by forming a recess having the base of a thin film-like pressure-receiving membrane on a silicon wafer surface by etching and providing a pressure receiving membrane for measuring static pressure in the recess. CONSTITUTION:A capillary column 6, a flow passage groove 2 of a carrier gas and a flow passage groove of a gas for a detector are formed on the specular surface of a silicon wafer 1. An inlet hole 3 for the carrier gas and an injection hole 4 for a sample gas are provided to penetrate the wafer 1 and further a detector 9 is communicated with the outlet of the column groove 6. The recess 5 attached with the pressure receiving membrane having, for example, 2mm.X2mm. pressure receiving area and 10-20mum thickness is provided to the groove 2 and is so constituted as to communicate in a T shape with the groove 2. The recess is thus directly formed on the surface of the wafer 1 and the pressure receiving membrane is provided and therefore the measurement of the gaseous pressure in the flow passage of the capillary column is made easy and the reduction in the size is made easy. |
