发明名称 FORMING METHOD OF THIN FILM AND EQUIPMENT THEREOF
摘要 PURPOSE:To increase the probability of adhesion of molecules to a substrate, to improve the crystallinity of a thin film and to form the highly accurate thin film by controlling the thin film being formed measuring the quantity of flow and the speed of molecular beams used for forming of the thin film and feeding back to a molecular beam generator. CONSTITUTION:A molecular beam ejected from a heating container 2 wherein the raw material 1 of an element for forming a thin film is heated is converted to the pulse like molecular beams 5 by a toothed wheel like circular disk called a chopper 4, the extension is limited by an aperture 6 and ionized by the ion source 8 of a quadruple mass spectrometer 7. The greater part of the molecular beam which is not ionized by the ion source 8 of the mass spectrometer 7 proceeds straight, adheres to the surface of a substrate 11 which is kept at an appropriate temperature by a heater 10 and the thin film 12 is formed. Meanwhile, the ion within the mass spectrometer 7 is converted to an electron, multiplied by a multiplier 13 and collected by a collector 14. The current of the collector 14 is converted to an electric signal by a current-voltage converter 15, sent to a flow and speed meter 16 and the output is fed back to a heat controller 3 to control the thin film 12.
申请公布号 JPS60225422(A) 申请公布日期 1985.11.09
申请号 JP19840081121 申请日期 1984.04.24
申请人 HITACHI SEISAKUSHO KK 发明人 YAMAMOTO YOSHIHIKO
分类号 H01L21/268;C23C14/54;C30B23/08;H01L21/203 主分类号 H01L21/268
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