| 摘要 |
PURPOSE:A novel polymer useful as a resist material having high sensitivity and high resolving power, showing radiation sensitivity, containing a specific perfluoroalkyl group. CONSTITUTION:For example, a perfluoroalkylaryl iodonium shown by the formula I [Rf is 2-20C perfluoroalkyl; Ar is (substituted)phenyl; R is 1-5C perfluoroalkyl, lower alkyl, or OH] is reacted with a polymer (e.g., poly alpha-methylstyrene, etc.) consisting of a repeating unit shown by the formula II (R<1> is 1-5C alkyl), to give a novel polymer containing a perfluoroalkyl group shown by the formula III[x and y show numbers of each monomer unit, value of x/(x+y) is 0.01- 1.0].
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