| 发明名称 |
Registering and exposing sheet substrates using photosensitive liquid |
| 摘要 |
A process is disclosed for the application of a photosensitive liquid between the substrate and the photomask during contact printing. The substrate and photomask are aligned in a hinged relationship.
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| 申请公布号 |
US4548884(A) |
申请公布日期 |
1985.10.22 |
| 申请号 |
US19840612862 |
申请日期 |
1984.05.22 |
| 申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
HEIART, ROBERT B. |
| 分类号 |
B32B37/24;G03F7/16;G03F7/20;H05K3/00;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
B32B37/24 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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