发明名称 PHOTOMASK AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE SAME
摘要 PURPOSE:To eliminate the necessity of preparing a different photomask for each pattern, by using a photomask in which a pattern can be changed arbitrarily by an external driving system while the photomask remains placed in an exposure unit. CONSTITUTION:Liquid crystal of melted dichromatic dye having anisotropy in absorption of visible light in the macroaxis and the brachyaxis directions such as azo-methine dye, for example, nematic liquid crystal 9 having negative dielectric anisotropy whose molecules are configurated vertically by the electric field is provided with transparent substrates 1 and 2 on both sides thereof and a photomask 10 is provided. The substrates 1 and 2 have stripe transparent electrodes 3, 4, 5 and 6. The scanning electrode 14 and the display electrode 15 are driven by an external driving system 13 such that a voltage is applied to a predetermined region of the liquid crystal whereby a pattern 16 on the photomask 10 is rendered light-transmissive.
申请公布号 JPS60208832(A) 申请公布日期 1985.10.21
申请号 JP19840065332 申请日期 1984.04.02
申请人 MATSUSHITA DENKI SANGYO KK 发明人 TSUJI KAZUHIKO;SUGANO MASAHIDE;TANIGUCHI TAKASHI;SHIYOUREN SHIROJI
分类号 G03F1/00;G03F1/54;G03F7/20;H01L21/027 主分类号 G03F1/00
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