发明名称 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE
摘要 A photoimaging system for exposing a member having a photopolymerizable coating thereon to actinic radiation is characterized by a fresnel lens disposed intermediate a source of actinic radiation and a support frame for supporting the member. The fresnel lens is adapted to collimate radiation emitted from the source and direct that radiation in substantially parallel ray paths such that the radiation impinges onto the surface of the member carried on the support frame in a direction substantially perpendicularly thereto over the entire surface area of the member.
申请公布号 DE3360694(D1) 申请公布日期 1985.10.10
申请号 DE19833360694 申请日期 1983.02.04
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 WADDINGTON, MARVIN, JR.
分类号 G03F7/20;H01L21/027;H01L21/30;H05K3/00;(IPC1-7):G03F7/20 主分类号 G03F7/20
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