Novel electron beam resist materials.

摘要

Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula
<Chemistry id="chema01" num="0001"><Image id="ia01" he="41" wi="68" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" inline="no" /></Chemistry>in which R<Sub>1</Sub>, R<Sub>2</Sub> and R<Sub>3</Sub> independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R<Sub>4</Sub> represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.