发明名称 |
RADIATION-SENSITIVE POLYIMIDE PRECURSOR COMPOSITION DERIVED FROM A DIARYL FLUORO COMPOUND |
摘要 |
<p>A radiation-sensitive polyimide precursor composition comprises a polymer of the formula < IMG > wherein n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the polymer with a number average molecular weight of about 1500-15,000 as determined by vapor pressure osmometry, and wherein for any particular unit in the polymer: denotes isomerism; R1 is a divalent aromatic, aliphatic or cycloaliphatic radical containing at least 2 carbon atoms; R2 and R3 are selected from the group consisting of a hydrogen radical and any organic radical containing a photopolymerizable olefinic double bond; and R4 and R5 are selected from the group consisting of perfluoro and parhalofluoro aliphatic hydrocarbons having 1 to 8 carbons;</p> |
申请公布号 |
CA1195039(A) |
申请公布日期 |
1985.10.08 |
申请号 |
CA19820418747 |
申请日期 |
1982.12.30 |
申请人 |
DU PONT (E.I.) DE NEMOURS AND COMPANY |
发明人 |
GOFF, DAVID L. |
分类号 |
G03F7/025;C08F290/14;C08G73/10;C08L79/08;G03F7/037;(IPC1-7):C09D5/25;C09D3/20 |
主分类号 |
G03F7/025 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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