发明名称 RADIATION-SENSITIVE POLYIMIDE PRECURSOR COMPOSITION DERIVED FROM A DIARYL FLUORO COMPOUND
摘要 <p>A radiation-sensitive polyimide precursor composition comprises a polymer of the formula < IMG > wherein n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the polymer with a number average molecular weight of about 1500-15,000 as determined by vapor pressure osmometry, and wherein for any particular unit in the polymer: denotes isomerism; R1 is a divalent aromatic, aliphatic or cycloaliphatic radical containing at least 2 carbon atoms; R2 and R3 are selected from the group consisting of a hydrogen radical and any organic radical containing a photopolymerizable olefinic double bond; and R4 and R5 are selected from the group consisting of perfluoro and parhalofluoro aliphatic hydrocarbons having 1 to 8 carbons;</p>
申请公布号 CA1195039(A) 申请公布日期 1985.10.08
申请号 CA19820418747 申请日期 1982.12.30
申请人 DU PONT (E.I.) DE NEMOURS AND COMPANY 发明人 GOFF, DAVID L.
分类号 G03F7/025;C08F290/14;C08G73/10;C08L79/08;G03F7/037;(IPC1-7):C09D5/25;C09D3/20 主分类号 G03F7/025
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