发明名称 |
HIGH FREQUENCY COIL FOR ION PLATING APPARATUS |
摘要 |
PURPOSE:To prevent that the atoms of coil forming metal are released into plasma and moreover to protect a coil from external circumference by inserting a coil into a pylex glass tube or quartz glass tube having very low sputter. CONSTITUTION:A pylex glass tube or quartz glass tube 2 is provided in such a fashion that a metal high frequency coil 1 is surrounded from the external side and it is sealed therein. The end portion 3 of glass tube 2 is sealed while the other end 4 is opened. The high frequency coil 1 and glass tube 2 are not closed alternately and an internal diameter of glass tube 2 is set to 2-3 times the external diameter of high frequency coil 1. Both coil and glass can be manufactured spirally and when these are set in the separated positions, contact between them by heating can be eliminated even when thermal expansion coefficients of them are different. |
申请公布号 |
JPS60192308(A) |
申请公布日期 |
1985.09.30 |
申请号 |
JP19840047237 |
申请日期 |
1984.03.14 |
申请人 |
SHOWA DENKO KK |
发明人 |
KATOU MASAHIKO;NINAGAWA JINICHI |
分类号 |
C23C14/32;H01F17/02;H01F27/00;H01F27/23 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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