| 摘要 |
PURPOSE:To improve storage stability and adhesion to a resist, and mechanical strength by incorporating carbon in a thin tungsten film. CONSTITUTION:A photomask material is prepared by forming a thin tungsten film 3 contg. 10-70, preferably, 35-55atom% carbon on a base 2. The film 3 may contain other atoms, such as oxygen, nitrogen, or hydrogen. As the thin tungsten film, a thin tungsten film contg. carbon may be formed on the tungsten film layer contg. nitrogen and/or oxygen. An amt. of carbon has no effect if it is <=10atom%, and it is deteriorated in etching characteristics if >70atom%. Carbon can be incorporated by depositing tungsten in an atm. contg. methane acetylene, or the like contg. carbon atoms in the compsn. by vacuum evaporation or sputtering. |
