| 摘要 |
PURPOSE:To obtain a high luminescent pattern irradiation capability in an electric field type ion source by forming the nib of an emitter tip with a porous metal and filling the cavity inside the tip with a liquefied gas to become ionization ions. CONSTITUTION:An electric field type ion source applied to such as the irradiation source of a lithographic device is formed by including an emitter tip 7 as an ionization electrode, which has a sharp curvature surface 10 at the nib made of a porous metal 8 solidified by sintering fine metal particles, an insulating body 9 of such as ceramics to support the emitter tip 7, and a draw-out electrode 2, and by filling the cavity 11 inside the tip 7 with liquefied gas such as hydrogen to become ionization ions. An amount of ionized gas is discharged in such a rapid process that when an ion source atom flown in from the porous metal 8 is ionized, the next atom flows in immediately and is ionized. Therefore, the luminance at the exposure ion irradiation source can be sharply increased. |
