| 摘要 |
PURPOSE:To obtain the titled composition of both outstanding thermal oxidation and light resistance, by incorporating a polyetherpolyamide elastomer-based polymer with specific compounds as radical scavenger, peroxide decomposer, ultraviolet light absorber and ultraviolet light stabilizer, respectively. CONSTITUTION:The objective composition can be obtained by incorporating (A) a polymer blend totalling 100pts.wt. made up of (1) 30-100 (pref. 40-100) pts.wt. of polyetherpolyamide elastomer (2) 70-0 (pref. 60-0) pts.wt. of polyamide resin and (3) 60-0pts.wt. of acid-modified olefin copolymer with (B) each 0.02-3 (pref. 0.05-2) wt% of compounds as stabilizers of formulae I , II and III (R is S, NHCO, etc.; R' is OH-substituted or unsubstituted 1-18C hydrocarbon group; R1 and R2 are each H or 1-18C alkyl group; R3 is 1-18C hydrocarbon group; R4 is H or R3, the number of carbon atoms belonging to R3 and R4 totalling >=7; l is 0-2; m is 1-4; n is 0 or 1; P is 1-4; X is halogen; R5 and R<6> are each H or 2-23C hydrocarbon group) and (C) 0-3wt% of another compound, as an optional component, of formula IV (Z is H or O; Y is O or N). |
