发明名称 METHOD OF PRODUCING SEMICONDUCTOR COMPONENTS HAVING A METAL SUBSTRATE
摘要 <p>An adhesive layer (3) and an insulating layer (4) of ceramic material are consecutively applied by plasma jet spraying to a surface of a metal substrate (2) roughened by sandblasting. Then a solderable layer (5) is applied to the insulating layer (4) and at least one integrated circuit, in particular a power semiconductor (1) is then soldered to it. The insulating layer (4) makes possible an insulated structure of the integrated circuit under these circumstances. The thickness of the insulating layer (4) is at the same time specified only on the basis of the desired dielectric strength, i.e. the insulating layer (4) is applied thinly enough to ensure a good removal of the heat loss produced in the integrated circuit into the metal substrate (2). The adhesive layer (3) is intended to prevent the insulating layer (4) peeling off under thermal alternating loads. A material whose coefficient of thermal expansion is between that of the metal substrate (2) and that of the ceramic substrate of the insulating layer (4) is therefore used for the insulating layer (3). Preferably, the adhesive layer (3) is made up of a plurality of sublayers in a way which results in a gradual transition in the coefficient of thermal expansion. <IMAGE></p>
申请公布号 EP0139205(A3) 申请公布日期 1985.09.11
申请号 EP19840110782 申请日期 1984.09.10
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 LAUTERBACH, RICHARD
分类号 H05K3/44;H01L21/52;H01L21/58;H01L23/14;H05K1/05;H05K3/38;(IPC1-7):H01L23/14 主分类号 H05K3/44
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