发明名称 |
Calibration apparatus for capacitance height gauges |
摘要 |
In an electron beam lithography apparatus a capacitance height gauge is used to determine the distance between a reticule and electron optics. In order to calibrate the capacitance gauge an optical interferometer, including a mirror are mounted on the same axis as the capacitance gauge. The mirror is moved a predetermined distance so that the movement distance measured by the capacitance gauge and the interferometer can be compared.
|
申请公布号 |
US4539835(A) |
申请公布日期 |
1985.09.10 |
申请号 |
US19840589902 |
申请日期 |
1984.03.14 |
申请人 |
CONTROL DATA CORPORATION |
发明人 |
SHAMBROOM, JOHN R.;SLISKI, ALAN P. |
分类号 |
G01B3/00;G01B7/06;G01B7/14;G01B11/14;G01B21/16;G03F9/00;G03F9/02;H01J37/304;(IPC1-7):G01B21/16 |
主分类号 |
G01B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|