| 摘要 |
PURPOSE:To minimize the decrease in temp. and to provide high dimensional accuracy by providing a mechanism for changing the injecting direction of a developing soln. and/or rinse soln. while a nozzle injects said liquid into a bar shape to a developing device. CONSTITUTION:A vacuum chuck 2 installed in a chamber 1 of a developing device is rotated by a motor to rotate a substrate 3 subjected to selective exposure after coating of a resist 4 around the perpendicular axis at a prescribed number of revolutions during the developing process while holding horizontally the substrate 3. The development of the resist layer is executed when a nozzle 5 releasing a developing soln. 6 into a bar shape repeats reciprocating motion while changing the direction in the range covering the desired area of the substrate 3 to be treated. If such developing device is used, the temp. of the developing soln. is made easily controllable within + or -1 deg.C and the developing process to high dimensional accuracy of a pattern is made possible. |
