| 摘要 |
PURPOSE:To form a pattern for a monomolecular film or a monomolecular depositing film by forming a lift-off layer on a foundation on which the monomolecular film or the monomolecular depositing film is laminated. CONSTITUTION:A pattern forming surface 4-6 in a plate-shaped substrate 4-1 is cleaned sufficiently, a lift-off layer 4-4 is formed according to a desired pattern, and a monomolecular film or monomolecular depositing film 4-5 is laminated on the whole surface. When the lift-off layer 4-4 is removed through etching, the monomolecular film or the monomolecular depositing film shaped on the surface of the lift-off layer 4-4 is removed together with the lift-off layer 4-4, and the monomolecular film or monomolecular depositing film 4-5 of a desired pattern is left on the foundation 4-1, thus completing patterning. The lift-off layer 4-4 is etched through an intrusion of an etching liquid from the stepped sections 4-7 of the lift-off layer and the foundation 4-1. It is because adhesion is weak and density is also small in the monomolecular film or monomolecular depositing film 4-5 formed at the stepped sections. |
