| 摘要 |
PURPOSE:To perform the collation on a microscopic pattern at a high speed by a method wherein a reflection charged particle group generated by the irradiation of a plurality of charged beams is detected, a signal process is performed thereon, one of its signal is compared with the remainder of signals, and an output corresponding to the result of said comparison is used for the above-mentioned collation. CONSTITUTION:Electron beams 21 and 22 are converged and deflected respectively and they are made to irradiate simultaneously on the prescribed part of the microscopic patterns 41 and 42 located on a sample 3, and reflection electron groups 71 and 72 are detected (51 and 52). The detected signals are signal-processed (61 and 62) and compared (8) with each other. The signal responsing to the result of comparison is outputted, and patterns 41 and 42 are collated with each other. According to this constitution, the collation of microscopic patterns can be performed at a high speed, because the pattern collation conducts a signal process by performing a comparison of the signal sent from said two patterns. |
