| 摘要 |
PURPOSE:To suppress the generation of an interference fringe on the surface to be irradiated, and to execute a uniform exposure by using plural laser light sources. CONSTITUTION:Laser lights emitted from laser light sources 1a, 1b are reflected by mirrors 2a, 2b, respectively, and led to conve lenses 4a, 4b, and on the other hand, laser light emitted from a laser light source 1c is led directly to a convex lens 4c as it is, the laser light which have passed through the convex lenses 4a, 4b and 4c, respectively, form secondary light sources A1, A2 and A3, and the respective divergent luminous fluxes irradiate uniformly the surface of a mask 6. Each secondary light source A1, A2 and A3 is formed by each separate laser light source 1a, 1b and 1c, therefore, the interference property between the luminous fluxes emitted from the secondary light sources A1, A2 and A3, respectively is low enough, and it does not occur that an interference fringe appears on the surface of the mask 6 and uniformity of an exposure of a wafer 7 is damaged.
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