| 摘要 |
PURPOSE:To enhance film forming efficiency, etc., by laminating an amorphous silicon film by the photo-CVD method and the one by the plasma CVD method to form the photosensitive layer of an electrophotographic sensitive body having an amorphous silicon photosensitive layer. CONSTITUTION:Rotatable substrates 7 are arranged in a reaction oven 1, and they are rotated each around its axis while they are revolved circularly around the central axis of the oven 1. Gaseous monosilane, ammonia, diborane, etc. are introduced into the oven 1, high frequency wave power is applied to an electrode 9, and an amorphous silicon film is formed on each of the substrates 7 by the plasma CVD method. Then, the gaseous monosilane and diborane, etc. are introduced into the oven 1, and beams are irradiated from a CO2 laser 3 to an amorphous silicon film formed on each of the substrates 7 to form an amorphous silicon film by the photo-CVD method. An intended electrophotographic sensitive body is obtained by aging forming another amorphous silicon film on this film of each substrate 7 by the plasma CVD method. |
