| 摘要 |
PURPOSE:To improve heat resistance, dry etching resistance and residual film rate by incorporating the plural alkali soluble resins contg. the repeated structural units expressed by the general formula and 1,2-quinone diazide compd. CONSTITUTION:A positive type resist compsn. is prepd. by incorporating the alkali soluble resins contg. the repeated structural unit expressed by the formula I , the repeated structural unit expressed by the formula II and/or the repeated structural unit expressed by the formula III and 1,2-quinone diazide compd. into said compsn. In the respective formulas, R<1>-R<4> denote the same or different hydrogen atoms, halogen atoms, alkyl group of 1-4 carbon atoms, alkoxy group, etc., R<5> denotes an alkyl group of 1-4C atoms, alkenyl group of 2-4C atoms, aryl group of 6-10C atoms, etc., R<6> denotes a hydrogen atom or methyl group, respectively. |
