| 摘要 |
PURPOSE:To restrain chemical reaction, the occurrence of mold and bacteria in the inside of a pellicle, and to prevent the occurrence of foreign matter and the defects of a pattern by forming bubbles in a stand, and enabling the air to flow inward and outward. CONSTITUTION:The stand plate 4 made of aluminum is erected around the surface of a glass plate 2 in a whole frame structure surrounding a mask pattern 3, and bonded to the surface of the glass plate with an adhesive. A transparent thin film, that is, a pellicle 5 made of the org. material of nitrocellulose or the like is stretched and bonded to the upper ends of the stand 4 with an adhesive, thus insulating the pattern face of a photomask, i.e., the surface of the glass plate 2 with the pellicle 5 and the stad 4. On the other hand, the stand 4 is provided with plural bubbles 6 on the circumference to allow the air to flow between the inside and the outside of the pellicle 5. |
