发明名称 PRODUCTION OF ALUMINUM BASE MATERIAL FOR VACUUM DEPOSITION
摘要 PURPOSE:To produce an aluminum base material for vacuum deposition by which a suitable product formed by vacuum deposition without surface defects is obtainable by subjecting the aluminum base material to a heat treatment in a vacuum prior to vapor deposition. CONSTITUTION:An aluminum base material obtd. by gas bubbling treatment of molten aluminum preferably prior to casting is subjected to a vacuum heat treatment at a suitable timing since casting till vacuum deposition treatment. The treating conditions for the vaccuum heating are about <=10<-3>Torr, more preferably about 10<-5>Torr high vacuum, about >=300 deg.C, more preferably about 450-550 deg.C heating temp., and about 1-2hr heating time which is longer the better. The gas in the aluminum base material is effectively removed by the above-mentioned treatment and the adequate product formed by vacuum deposition without surface defects such as blister, crack, pinhole, etc. is obtd.
申请公布号 JPS60159164(A) 申请公布日期 1985.08.20
申请号 JP19840014041 申请日期 1984.01.27
申请人 SHIYOUWA ARUMINIUMU KK 发明人 TANIMOTO SHIGEMI;TOYODA KAZUO;KAWABE AKIRA;AMAYA YOSHINORI
分类号 G02B5/08;C22F1/00;C22F1/04;C23C14/02;G03G5/00;G03G5/082;H01L21/28;H01L21/285;H01L31/04 主分类号 G02B5/08
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