发明名称 |
Process and device for producing a homogeneous large-volume plasma of high density and of low electronic temperature |
摘要 |
The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10-5 to 10-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.
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申请公布号 |
US4534842(A) |
申请公布日期 |
1985.08.13 |
申请号 |
US19840620136 |
申请日期 |
1984.06.13 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) |
发明人 |
ARNAL, YVES;PELLETIER, JACQUES;POMOT, CLAUDE |
分类号 |
C23C8/36;C23C16/511;H01J37/32;H05H1/11;(IPC1-7):C25B11/04;C23C15/00 |
主分类号 |
C23C8/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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