发明名称 ION BEAM GENERATION DEVICE
摘要 PURPOSE:To obtain the captioned device very sharply focusing ions without limiting the kinds of ion by irradiating the target with a laser beam for generating ions from the point irradiated by the laser beam. CONSTITUTION:A layer of the element of an objective ion kind is formed on the surface of the target 1 by vacuum evaporation. The laser beam from a laser 2 is focused on one point of the surface of the target 1 by a lens 3. As to the ions drawn out from an ion drawing out and exceleration electrode 4 arranged facing the target 1, only the objective ion kind is made to pass through a mass file 5 for being focused on a sample 7 by ion lenses 6. Since the surface of the target 1 is evaporated at the laser beam irradiation point for wearing away, the target 1 should be rotated and forwarded in the axial direction so that the laser beam irradiation point can sprirally move on the target surface.
申请公布号 JPS60146438(A) 申请公布日期 1985.08.02
申请号 JP19830252132 申请日期 1983.12.30
申请人 SHIMAZU SEISAKUSHO KK 发明人 SOEJIMA HIROYOSHI
分类号 G01N23/225;G01N27/62;H01J37/08;H01J37/252 主分类号 G01N23/225
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