ELECTROPHOTOGRAPHIC SENSITIVE BODY

摘要

PURPOSE:To provide high sensitivity at a short wevelength and high moisture resistance by forming further an amorphous silicon (a-Si:F) layer laminated to a specific film thickness on a conductive substrate. CONSTITUTION:Amorphous silicon (a-Si:H) contg. hydrogen is laminated to a prescribed thickness on a conductive substrate and gaseous fluorine having high purity is ionized in a vacuum and the ions are implanted to the a-Si:H layer to form the a-Si:F layer having a prescribed thickness. Since F has higher affinity to Si than H, the F implanted into the a-Si:H layer is bonded with Si to form an Si-F bond. The a-Si:F film having a high grade is thus formed and the electrophotographic sensitive body coated with the a-Si:F film having high moisture resistance is obte. The film thickness of the a-Si:F layer is preferably in a 0.1- 5mum range to obtain desired photosensitivity. Formation of the uniform film is difficult at <=0.1mum and the photosensitivity is deteriorated on the contrary if the thickness exceeds 5mum.