PRODUCTION OF THIN FILM MAGNETIC HEAD

摘要

PURPOSE:To enable wet etching of an org. resin insulating film at the zero point in the gap depth position with high accuracy by forming a denatured layer provided with etching selectability in the stage of etching the upper org. resin insulating film on the surface of a lower org. resin insulating film after etching. CONSTITUTION:A polyimide resin is coated as a lower org. resin film 5 on a substrate and is cured and thereafter the film is wet etched with resist as a mask to obtain a prescribed shape. After a conductive film is deposited thereon, the film is etched by an argon ion milling method to obtain a conductor coil 6. A denatured layer by argon ion milling is formed on the surface of the film 5 in this stage. The wet etching after coating and curing of the polyimide resin as an upper org. resin film 7 is simply required to be accomplished by taking only the film 7 into consideration as the film 5 is protected by the denatured layer and consequently the resist of the thinner film is required for the etching and the improved accuracy of the resist pattern is resulted.