| 摘要 |
PURPOSE:To produce a formed Al material which has an oxide film on the surface and is usable in a high vacuum by subjecting the surface of the formed Al material to dry etching to the dry surface having no hydrated oxide then heating the material in an oxygen gaseous atmosphere. CONSTITUTION:The surface of an Al or Al alloy shape material formed by extrusion forming, rolling, press forming, etc. is cleaned by dry etching such as electric discharge cleaning, reactive gas etching, plasma etching or the like to remove the hydrated oxide film by which the surface is cleaned. The material is then heated for 0.5-6hr at 200-300 deg.C in a gaseous mixture atmosphere composed of such inert gas which does not contact with the atm. air contg. moisture and consists of 1-10vol% oxygen and the balance Ar, He, etc. or a gas such as N inert with Al. The dense oxide film is formed on the surface of the formed Al material and even if such material is used in a high vacuum, no gas is released from the surface of the formed Al material and the high vacuum is maintained. |
