发明名称 FORMING OF ANTIREFLECTION FILM
摘要 PURPOSE:To form an antireflection layer having low reflectance to the surface of an optical part, etc., by coating a substrate with a partially polycondensed sol solution containing an organometallic compound, and treating the coating layer with a specific aqueous solution of an acidic salt. CONSTITUTION:One or more organometallic compounds e.g. a metal alkoxide such as Si(OC2H5)4, etc. are dissolved in an organic solvent such as alcohol, and stirred to effect the hydrolysis. The product is then subjected to the partial polycondensation reaction at normal temperature. The obtained sol solution is applied to the surface of an optical part such as glass substrate plate, and heat- treated to form an amorphous film. The amorphous film is treated with an aqueous solution obtained by adding <=0.01mol/l of polyvalent ion such as Al<3+>, Si<4+>, etc. to an aqueous solution containing 0.01-1mol/l of an acidic salt exhibiting weakly alkaline nature in aqueous solution, e.g. Na2HAsO4, etc. An antireflection film having low reflectance can be formed by only a chemical treatment.
申请公布号 JPS60127250(A) 申请公布日期 1985.07.06
申请号 JP19830234947 申请日期 1983.12.15
申请人 HOOYA KK 发明人 KANAMORI CHIEMI;NAKAJIMA SADAHIRO;TORATANI HISAYOSHI
分类号 C04B41/85;C03B8/02;C03B19/12;C03C17/02;G02B1/10;G02B1/11 主分类号 C04B41/85
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