发明名称 DEVICE FOR VAPOR DEPOSITION OF THIN FILM
摘要 PURPOSE:To obtain the high-quality vapor deposition film by reducing the electric power required and preventing corrosion of a crucible by providing wires made of a substance to be deposited with facing in the crucible and vaporizing the substance by discharge to supply the wires continuously. CONSTITUTION:Pressure in a tank 1 is kept at 10<-6>Torr and high voltage 31 is applied between wires 30a and 30b made of a substance to be deposited which face to each other through brushes 35a and 35b so as to start discharge and to generate a metallic vapor. While the discharge continues, the wires 30a and 30b are supplied from reels 32a and 32b continuously to keep a discharge interval constant. When a vapor pressure in a crucible 4 becomes 0.1Torr or below, the metallic vapor begins to jet out from a nozzle 4a into the tank 1 and cluster ions 16 are accelerated by an electric field between an electrode 14 and the crucible 4 and neutral clusters 15 are vapor-deposited on a substrate 18 by the kinetic energy of blowing. By this constitution, the electric power to be required fro operation can be reduced and corrosion of the crucible is prevented and the high-quality vapor-deposition film can be obtained continuously for a long time.
申请公布号 JPS60124920(A) 申请公布日期 1985.07.04
申请号 JP19830235570 申请日期 1983.12.12
申请人 MITSUBISHI DENKI KK 发明人 SHIYUHARA AKIRA;YAMANISHI KENICHIROU;MINOWA YOSHIFUMI;KOU SANJIYU;INA TERUO
分类号 H01L21/285;H01L21/203 主分类号 H01L21/285
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