发明名称 PRODUCTION OF ONE-DIMENSIONAL IMAGE SENSOR
摘要 PURPOSE:To reduce the material loss of a photoelectric conversion element film for picture information reading, to improve massproductivity and to reduce the production cost by forming many substrates like laminated state and forming the photoelectric conversion element films on the end surfaces of respective substrates. CONSTITUTION:Plural substrates 1 are horizontally laminated, the end surfaces of respective substrates 1 is alined and an amorphous silicone film is formed on the whole surface of the end surfaces 13 by plasma CVD method or the like. The amorphous silicone film is patterned to an one-dimensional array by photolithographic method and then an unnecessary part is removed to form an amorphous silicone film 3. Subsequently, individual electrodes 5 are wired on the surface 2 of the substrates 1 and a common electrode 4 is wired on the back surface 14. Namely, the amorphous silicone film 3 is formed on the end surfaces 13 in stead of the surface of the substrates 1. The plate thickness of the substrates 1 is sufficiently allowed to be >=0.2mm., so that the quantity of the amorphous silicone film to be removed is reduced and the loss of the amorphous silicone material is reduced.
申请公布号 JPS60119165(A) 申请公布日期 1985.06.26
申请号 JP19830227180 申请日期 1983.12.01
申请人 RICOH KK 发明人 ISHIDA TSUTOMU
分类号 H01L27/146;G06K9/20;G06T1/00;H01L27/14;H04N1/028 主分类号 H01L27/146
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